Aetolian Game News
Resistance Tweaks
Written by: Keroc, the Starborn
Date: Wednesday, September 17th, 2025
Addressed to: Everyone
Following up from the earlier changes to resistances (see Changelog #2525), I've made some further tweaks to some effects that were allowing a bit too much stacking when I considered the class in its whole and what it is capable of.
- EmbedArmour / Ward is now armour instead of resistance.
* They obtain a fair bit of elemental resistance from hounds already.
- Phalanx is now armour instead of resistance.
* Bit high for group scenarios for a class that probably shouldn't provide a ton of support.
- Spacing now only gives 8% resistance to cutting and blunt damage, down from 15%.
* Reduced to offset a variety of buffs that the class has gotten over time, like Closecombat.
- Putrefaction / Diminution no longer has a constant health drain to maintain.
- Putrefaction / Diminution now starts with 8 stacks, with each stack giving 3% cutting resistance.
+ It loses 1 stack each time you take cutting damage, but cannot reduce stacks to 0.
+ Stacks are refreshed every 8 seconds, and you take 40 health drain for each missing stack.
- Putrefaction / Diminution no longer gives resistance to blunt damage.
* The skill gave a lot of resistance for minimal / ignorable downsides, so I've rebalanced it.
I've also further tweaked some game-wide resistances that everyone has access to.
- Red mist no longer reduces PvE damage you take by 5%.
- Blue mist no longer grants the effects of Refining Shell, and will instead reduce PvE damage you take by 5%.
- White mist no longer increases ylem from eld, and will instead reduce Refining residual passive drains by half.
* While the odd 5% public resistance is fine, it should have some kind of upkeep when not tied to a class.
- Elemental manipulations from gauntlets are now armour instead of resistance.
* Getting 10% resistance for everyone makes stacking too easy, so it is turned into armour instead.
Penned by my hand on Falsday, the 3rd of Sapiarch, in the year 14 AC.